On Step-and-Scan Trajectories used in Wafer Scanners in Semiconductor Manufacturing
Yazan M. Al-Rawashdeh,Mohammad Al Janaideh,Marcel Heertjes,Yazan M. Al-Rawashdeh,Mohammad Al Janaideh,Marcel Heertjes
Adopting the ideal reliable machine model, the throughput of a lithography machine can be given as the reciprocal of the operation time. This time can be defined at the die level where the actual exposure process takes place as the time unit per die. A closer look at the motion profiles, namely step-and-scan trajectories, suggests that a multi-disciplinary design optimization should be involved wh...
